Pureon AGHall 3.0 - Stand 314

  • Machining
    • Polishing
    • Grinding/lapping
  • Auxiliary materials and tools for optics and optoelectronics
    • Lapping and grinding media
    • Polishing agents

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ULTRA-SOL® C100: Cerium oxide slurry
Designed to meet the demanding requirements of Precision Polishing applications, including super-polishing. Ultra-Sol C100 features a tightly distributed nano-cerium oxide abrasive. Leveraging decades of micronizing experience in the diamond world, Pureon is able to control the C100 with ...more

ULTRA-SOL® AlumaGem: Poly and mono diamond slurries
A novel blend of alumina and diamond abrasives which has proven itself to be an excellent polishing agent for precision optics materials such as calcium fluoride, zinc sulfide, and zinc selenide among many others. This combination yields excellent scratch-dig free surfaces material removal ...more

ULTRA-SOL® OPTIQ PRO: Cerium oxide slurry
High-purity cerium oxide slurry for optical polishing ULTRA-SOL® OPTIQ PRO is a high-purity cerium oxide slurry designed for the precision polishing of borosilicate glass, fused silica, glass ceramics, and other optical materials. OPTIQ PRO utilizes an enhanced manufacturing technique ...more

ULTRA-SOL® AlumaGem: Poly and mono diamond slurries
A novel blend of alumina and diamond abrasives which has proven itself to be an excellent polishing agent for precision optics materials such as calcium fluoride, zinc sulfide, and zinc selenide among many others. This combination yields excellent scratch-dig free surfaces material ...more