Product novelty 14. April 2026

Designed to meet the demanding requirements of Precision Polishing applications, including super-polishing. Ultra-Sol C100 features a tightly distributed nano-cerium oxide abrasive. Leveraging decades of micronizing experience in the diamond world, Pureon is able to control the C100 with high precision. The product is designed for super polish applications where roughness values below one angstroms are required with exceptionally low scratch-dig specifications. This slurry is commonly paired with pitch pads or poromerics. Manufactured under the strict requirements of ISO 9001, lot-tolot consistency is ensured with the use of SQC / SPC methods and automated process controls.

Typical applications Fused silica, Glass, Zerodur

Highlights:
- Smallest, most consistent cerium particles in the world
- Perfect abrasive for “superpolishing” of optical materials
- Exceeds semiconductor standards for STI CMP processes
- Compatible with polishing pitch or pad