Product novelty 14. April 2026
Expanded Measurement Capabilities: Nanometer-Precise Longitudinal Measurement with ELWIMAT-Laser
With the latest upgrade of its proven measurement platform, HOFBAUER OPTIK introduces the ELWIMAT-VFS featuring an integrated laser interferometer. In addition to its established capabilities in high-precision angular and positional metrology, the system now enables longitudinal position measurements with nanometer-level accuracy.
The newly integrated interferometer is based on a fiber-coupled laser source in the telecommunications wavelength range and is fully embedded into the existing ELWIMAT system architecture. This allows simultaneous measurement of translational motion and angular deviations, providing a significant advantage for the characterization of complex opto-mechanical systems.
Depending on the measurement range and environmental conditions, the achievable accuracy lies in the range of 10 to 100 nm. In combination with precise monitoring of environmental parameters such as temperature, pressure, and humidity, the influence of the air refractive index is effectively compensated, ensuring high absolute accuracy.
The ELWIMAT-VFS is particularly suited for applications in precision optics, fine mechanics, and machine calibration. Typical use cases include the alignment and measurement of optical assemblies, the analysis of guideway straightness and positioning accuracy, and the calibration of linear motion systems at the highest resolution.
Thanks to its modular design, the system can be flexibly configured—from single-axis setups to multi-channel measurement configurations. The combination of angular and longitudinal metrology within a single platform opens up new possibilities for the comprehensive evaluation of form, alignment, and motion errors.
With the ELWIMAT-VFS, HOFBAUER OPTIK once again sets new standards in optical precision metrology—true to its guiding principle:
Knowing the limit – pushing the limit.
The newly integrated interferometer is based on a fiber-coupled laser source in the telecommunications wavelength range and is fully embedded into the existing ELWIMAT system architecture. This allows simultaneous measurement of translational motion and angular deviations, providing a significant advantage for the characterization of complex opto-mechanical systems.
Depending on the measurement range and environmental conditions, the achievable accuracy lies in the range of 10 to 100 nm. In combination with precise monitoring of environmental parameters such as temperature, pressure, and humidity, the influence of the air refractive index is effectively compensated, ensuring high absolute accuracy.
The ELWIMAT-VFS is particularly suited for applications in precision optics, fine mechanics, and machine calibration. Typical use cases include the alignment and measurement of optical assemblies, the analysis of guideway straightness and positioning accuracy, and the calibration of linear motion systems at the highest resolution.
Thanks to its modular design, the system can be flexibly configured—from single-axis setups to multi-channel measurement configurations. The combination of angular and longitudinal metrology within a single platform opens up new possibilities for the comprehensive evaluation of form, alignment, and motion errors.
With the ELWIMAT-VFS, HOFBAUER OPTIK once again sets new standards in optical precision metrology—true to its guiding principle:
Knowing the limit – pushing the limit.
HOFBAUER
OPTIK Mess- & Prüftechnik
Contact
Ms. Margit Hofbauer